X-Ray/UV Photoemission and Surface Analysis

UHV

SPECS ultra-high vacuum (UHV) system for sample characterization by methods of

  • X-ray and ultraviolet photoelectron spectroscopy (XPS/UPS)
  • angle resolved photoelectron spectroscopy (ARPES) with 3D spin detector
  • low energy electron diffraction (LEED)
  • low energy ion scattering spectroscopy (LEIS)
  • scanning tunneling microscopy (STM) and non-contact atomic force microscopy (ncAFM)

The system consists of four interconnected vacuum chambers (SPECS) pumped by turbomolecular and ion getter pumps (pressure of residual gases ~ 10-10 mbar). 

Features:

  • Micro-focus X-ray source (200 um) and duoplasmatron UV source
  • Monochromators for X-ray and UV radiation
  • Hemispherical 180° electron energy analyzer SPECS PHOIBOS 150 with scanning angle lens (SAL) system, angular resolution better than 0.1°, energy resolution better than 2 meV
  • Two-dimensional CCD detector, deflector 90°, spin rotator and FERRUM VLEED-type spin detector (FOCUS) 
  • Motorized 5-axes sample manipulator
  • Sample holder cooling by liquid He down to 20 K
  • Low energy (10-200 keV) and high energy (0.2-5 keV) ion source with differential pumping
  • Reverse view LEED optics
  • Aarhus STM, electron beam evaporator and microwave plasma source.
  
Contact Person
Martin Kalbáč
Location
2nd floor, room 207